2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...
A method that boosts the contrast of high-resolution optical images has the potential to enable lithography at the nanoscale. A method that boosts the contrast of high-resolution optical images has ...
The research team proposed a method called aberration-converged annular lithography (ACAL) system, as schematic diagram shown in Figure 1. The Gaussian beam is converted into a collimated annular beam ...
The future of semiconductor technology is often viewed through the lenses of photolithography equipment, which continues to offer better resolution for future process nodes despite an almost perpetual ...
Results that may be inaccessible to you are currently showing.
Hide inaccessible results