TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...
ASML provided Intel, its first customer, with the $380 million Twinscan EXE:5000 High-NA lithography machine. Yesterday, it shipped its second High-NA EUV lithography machine to a mystery customer.
TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has begun development of a photomask manufacturing for 2-nanometer (10-9 meter) generation logic semiconductors that support ...
There's a conventional wisdom among investors that Intel (NASDAQ: INTC) is significantly behind Taiwan Semiconductor ...
Intel's Oregon team has accomplished a significant feat, assembling its first High NA EUV lithography tool. This cutting-edge technology is set to be operational within the year. The machine, costing ...
Glass masks contribute to EUV mask blanks market expansion by offering exceptional surface smoothness, dimensional stability, ...
TSMC Senior VP Kevin Zhang spoke at a conference in Amsterdam this week, where he said TSMC's new A16 plants could be designed to accommodate the technology, but it's not certain... remember, TSMC is ...
ASML is on track to ship the industry's first extreme ultraviolet (EUV) lithography scanner with a 0.55 numerical aperture (NA) this year. Company CEO Peter Wennink said that ASML's Twinscan EXE:5000 ...
How Does EUV Lithography Work? EUV Lithography is a state-of-the-art technology in chip manufacturing that uses highly energetic ultraviolet light to carve detailed patterns onto semiconductor ...
SK Hynix plans to invest KRW2 trillion ($1.5 billion) in 2024 to introduce extreme ultraviolet (EUV) lithography equipment to cope with the new generation of memory investment in advanced process ...
Imec is a world-leading research and innovation center in nanoelectronics and digital technologies. Imec has more than 6.000 employees and top researchers, for R&D in advanced semiconductor and system ...
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