ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

Surface decomposition reactions and growth mechanisms are the key influences on the physicochemical properties of the deposited films. It is therefore essential to fully characterize and understand ...

Hybrid organic-inorganic perovskite solar cells are heavily researched due to their potential to offer both high conversion efficiency and low cost. However, so far, environmental device stability is ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...

Anna Demming discovers why the vacuum-based technique of atomic-layer deposition – a variant of chemical-vapour deposition – holds so much promise for energy and environmental applications Greener ...

With its newly-developed “Spatial ALD” deposition system, Laser Zentrum Hannover can now also uniformly coat complex-shaped optics. The innovative system achieves higher deposition rates than ...